Sensitivity and Contrast Characterization of PMMA 950K Resi… — KazNU

Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure

2025 · Article
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Publication year

2025

Authors

Source: Micromachines

DOI: 10.3390/mi16080958

Scopus: Open in Scopus

Fields of knowledge

Control and Systems Engineering Electrical and Electronic Engineering Mechanical Engineering