Sensitivity and Contrast Characterization of PMMA 950K Resi… — КазНУ

Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure

2025 · Article

Год публикации

2025

Источник: Micromachines

DOI: 10.3390/mi16080958

Scopus: Открыть в Scopus

Области знаний

Control and Systems Engineering Electrical and Electronic Engineering Mechanical Engineering