Sensitivity and Contrast Characterization of PMMA 950K Resi… — ҚазҰУ

Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure

2025 · Article

Жариялану жылы

2025

Дереккөз: Micromachines

DOI: 10.3390/mi16080958

Scopus: Жазбаны Scopus-та ашу

Білім салалары

Control and Systems Engineering Electrical and Electronic Engineering Mechanical Engineering